Method of growing a thin film onto a substrate
S Lindfors, P Soininen - US Patent App. 11/358,698, 2007 - Google Patents
A method of growing a thin film onto a substrate placed in a reaction chamber according to
the ALD method by subjecting the substrate to alternate and successive surface reactions …
the ALD method by subjecting the substrate to alternate and successive surface reactions …
Method of growing a thin film onto a substrate
S Lindfors, PT Soininen - US Patent 6,783,590, 2004 - Google Patents
A method of growing a thin film onto a substrate placed in a reaction chamber according to
the ALD method by subjecting the substrate to alternate and successive surface reactions …
the ALD method by subjecting the substrate to alternate and successive surface reactions …
Substrate lift mechanism and reactor including same
E Hill, J Disanto - US Patent 10,770,336, 2020 - Google Patents
(57) ABSTRACT A substrate support assembly suitable for use in a reactor including a
common processing and substrate transfer region is disclosed. The substrate support …
common processing and substrate transfer region is disclosed. The substrate support …
Method of growing a thin film onto a substrate
S Lindfors, PT Soininen - US Patent 7,018,478, 2006 - Google Patents
(57) ABSTRACT A method of growing a thin film onto a substrate placed in a reaction
chamber according to the ALD method by sub jecting the Substrate to alternate and …
chamber according to the ALD method by sub jecting the Substrate to alternate and …
Method for processing a substrate
S Lee, H Kim, S Choi, YH Gu - US Patent App. 17/233,382, 2021 - Google Patents
Provided is a method to adjust a film stress. In one embodiment, a first film is formed on the
substrate by supplying a first reactant and a second reactant sequentially and alternately in …
substrate by supplying a first reactant and a second reactant sequentially and alternately in …
Removable substrate tray and assembly and reactor including same
E Hill, J Tolle, M Goodman - US Patent App. 14/219,879, 2015 - Google Patents
(73) Assignee. ASM IP Holding BV, Almere (NL) A Substrate tray, a Susceptor assembly
including a substrate tray, and a reactor including a Substrate tray and/or Susceptor …
including a substrate tray, and a reactor including a Substrate tray and/or Susceptor …
Method for cleaning quartz epitaxial chambers
G Deye, JP Margetis, J Tolle - US Patent App. 16/888,423, 2020 - Google Patents
A method of cleaning an epitaxial reaction chamber in-situ is disclosed. The method may
include a pre-coating step, a high temperature baking step, and a gas etching step. The …
include a pre-coating step, a high temperature baking step, and a gas etching step. The …
Gas distribution assembly and method of using same
Y Mori, VHBG Babin, N Tsuji - US Patent App. 17/171,793, 2021 - Google Patents
A gas distribution assembly and methods for adjusting the gas flow through a gas supply
unit into a reaction chamber are disclosed. The gas distribution assembly and methods can …
unit into a reaction chamber are disclosed. The gas distribution assembly and methods can …
Method and system to reduce outgassing in a reaction chamber
SH Jung, P Raisanen, EJC Liu, M Schmotzer - US Patent 8,993,054, 2015 - Google Patents
Systems and methods of reducing outgassing of a Substance within a reaction chamber of a
reactor are disclosed. Exem plary methods include depositing a barrier layer within the …
reactor are disclosed. Exem plary methods include depositing a barrier layer within the …
Variable gap hard stop design
M Schmotzer, S Whaley - US Patent 10,087,525, 2018 - Google Patents
(57) ABSTRACT A reaction system for processing semiconductor substrates is disclosed.
The reaction system includes a susceptor for holding the substrate as well as a baseplate as …
The reaction system includes a susceptor for holding the substrate as well as a baseplate as …