Nanosphere lithography (NSL) is a simple, high-throughput technique that can be used to
form large-area, close-packed monolayer arrays of nanospheres. These arrays can be …

While three-dimensional (3D) configurable hierarchical nanostructures have wide ranging
applications in electronics, biology, and optics, finding scalable approaches remains a …

A tunable nanosphere lithography (NSL) technique is combined with metal-assisted etching
of silicon (Si) to fabricate ordered, high-aspect-ratio Si nanowires. Non-close-packed …

Conventional nanosphere lithography holds the drawbacks of lacking precise control over
the shape and architecture of the resultant nanostructures. In this work, nanoimprinting …

Silicon nanoneedles emerged as powerful therapeutic tools to deliver wide range of
biocargoes into cells. But their fabrication process is usually complex and costly. The thesis …

Here, we present a fabrication procedure that can produce large-area, size-tunable, periodic
silicon nanopillar arrays, using metal templates that are created via nanosphere lithography …

This work demonstrates a new nanosphere lithography technique, termed stepwise
nanosphere lithography, to create matrices of novel two-and three-dimensional …

One of the most challenging but potentially rewarding goals in nanoscience is the ability to
direct the assembly of nanoscale materials into functional architectures with high yields …