Wafer-scale production of patterned transition metal ditelluride layers for two-dimensional metal–semiconductor contacts at the Schottky–Mott limit

S Song, Y Sim, SY Kim, JH Kim, I Oh, W Na, DH Lee… - Nature …, 2020 - nature.com
A key challenge in the development of two-dimensional (2D) devices is the fabrication of
metal–semiconductor junctions with minimal contact resistance and depinned energy levels …
被引用次数：113 相关文章

Wafer-scale production of patterned transition metal ditelluride layers for two-dimensional metal-semiconductor contacts at the Schottky-Mott limit

S Song, Y Sim, SY Kim, J Hwa, I Oh, W Na, DH Lee… - 2020 - scholarworks.unist.ac.kr
A key challenge in the development of two-dimensional (2D) devices is the fabrication of
metal-semiconductor junctions with minimal contact resistance and depinned energy levels …

Wafer-scale production of patterned transition metal ditelluride layers for two-dimensional metal–semiconductor contacts at the Schottky–Mott limit

S Song, Y Sim, SY Kim, JH Kim, I Oh, W Na, J Wang… - Nature Electronics, 2020 - pr.ibs.re.kr
IBS Publications Repository: Wafer-scale production of patterned transition metal ditelluride
layers for two-dimensional metal–semiconductor contacts at the Schottky–Mott limit IBS Public …