… interconnects processing. In the present paper, we focus on porous SiOCH low-k damage
… Then, the impact of wettability for condensation is demonstrated. These first results enable a …

… reduction methods in the etching of porous low-k dielectric, … ) processes and, the effects of
pulsed plasmas on the PID of … and the three peaks related to the low-k structure which are ‘Si-O…

… reduction methods in the etching of porous low-k dielectric using … Before investigating the
effect of RF pulsing, the etching by … structure from Si-O-CH structure during the plasma etching …

… of porous low-k dielectrics is a complex process involving … reduced degradation during
plasma etching processes. These … A more detailed deposition process and the porous structure …

… the atomic layer process of anisotropic plasma etching with low … effect is etching at
significantly low temperatures. … porous structure from deep penetration of active plasma radicals. …

… of the chemical structure of an OSG, due to the effects of different … Unsurprisingly, the main
processes determining low-k … that under conventional conditions for low-k etching [6], plasma …

… for porous SiCOH by using plasma etching methods such as … etch characteristics of porous
SiCOH such as etch rate, etch … , therefore, its green house effect can be much lower than …

… in the modern process flows to reduce the negative impact of … by the formation of a porous
structure due to the removal of … of demethylated low-k can move at the same speed as the etch …

… and generate porosity in organosilicate (OSG) low-k films. … related to plasma processing (dry
etch, plasma assisted … phase removal, creation of porous structure, and strengthening of the …

… of the low-k dielectrics and their pore structure, eg by … The impact of the deposition process
on low-k dielectric layer … of the etching process which may strongly roughen a porous low-k …