Optical properties of nanoporous germanium thin films

D Cavalcoli, G Impellizzeri, L Romano… - … applied materials & …, 2015 - ACS Publications
In the present article we report enhanced light absorption, tunable size-dependent blue shift,
and efficient electron–hole pairs generation in Ge nanoporous films (np-Ge) grown on Si …

Long germanium nanowires prepared by electrochemical etching

C Fang, H Föll, J Carstensen - Nano letters, 2006 - ACS Publications
Germanium (Ge) nanowires have been produced by electrochemical etching of single-
crystalline n-type Ge {100} in a HCl-containing aqueous electrolyte. Macropores could be …

Germanium surface wet-etch-reconditioning for porous lift-off and substrate reuse

A Chapotot, B Ilahi, J Arias-Zapata, T Hanuš… - Materials Science in …, 2023 - Elsevier
Reducing both the cost and weight of Germanium (Ge)-based devices is a key concern in
extending these technologies to mainstream applications. In this framework, the porous Ge …

Templated germanium nanowire synthesis using oriented mesoporous organosilicate thin films

H Jagannathan, M Deal, Y Nishi, HC Kim… - Journal of Vacuum …, 2006 - pubs.aip.org
The authors report on a technique of combining low temperature nanowire synthesis with
self-assembly of block copolymers in order to obtain a controlled array of nanowires. An …

Rapid formation of single crystalline Ge nanowires by anodic metal assisted etching

SJ Rezvani, N Pinto, L Boarino - CrystEngComm, 2016 - pubs.rsc.org
Germanium nanowires are produced by a novel approach, combining two well known
electrochemical and metal assisted chemical etching. The metal assisted etching procedure …

Electrodeposition of protocrystalline germanium from supercritical difluoromethane

CY Cummings, PN Bartlett, D Pugh, G Reid… - …, 2016 - Wiley Online Library
We report results for the electrochemistry of the germanium (II) tri‐halide anions,[GeCl3]−,[
GeBr3]− and [GeI3]−, in supercritical difluoromethane containing 60 mm [NnBu4][BF4] at …

Black germanium produced by inductively coupled plasma etching

S Schicho, A Jaouad, C Sellmer, D Morris, V Aimez… - Materials Letters, 2013 - Elsevier
We report on a lithography-free self-organized inductively coupled plasma (ICP) etching
process to manufacture nanostructured Ge surfaces with a strong absorbance in the visible …

Germanium electrodeposition into porous silicon for silicon-germanium alloying

N Grevtsov, E Chubenko, V Bondarenko, I Gavrilin… - Materialia, 2022 - Elsevier
A method of germanium electrodeposition from a GeO 2-based aqueous solution into the
pore channels of anodic mesoporous silicon formed on n-type highly-doped (100) silicon …

Anti-reflective porous Ge by open-circuit and lithography-free metal-assisted chemical etching

YY Zhang, SH Shin, HJ Kang, S Jeon, SH Hwang… - Applied Surface …, 2021 - Elsevier
Abstract Porous Ge (PGe) layer is formed on single-crystalline Ge (c-Ge) as well as in a
releasable form (eg, free-standing PGe) by lithography-free metal-assisted chemical etching …

Bottom-up synthesis of mesoporous germanium as anodes for lithium-ion batteries

D Tang, H Yu, J Zhao, W Liu, W Zhang, S Miao… - Journal of colloid and …, 2020 - Elsevier
A series of mesoporous germanium materials were synthesized via the self-templating
method. Germanium tetrachloride and sodium potassium alloy were utilized as germanium …