Current techniques of patterned material deposition require separate steps for patterning
and material deposition. The complexity and harsh working conditions post serious …

Direct patterning technology holds significant promise owing to its ability to streamline
complex patterning processes, fostering affordable design and production of various …

Continued progress in the fast-growing field of nanoplasmonics will require the development
of new methods for the fabrication of metal nanostructures. Optical lithography provides a …

Optical lithography at ultraviolet (UV) wavelengths is the standard process for patterning 90-
nm state-of-the-art devices in the semiconductor industry, and extensions to 45 nm and …

A number of non-lithographic techniques are now available for processing materials on the
nanoscale, including optical techniques,,,,,, capable of producing features that are much …

The ability to directly create patterns with size scales below 100 nm is important for many
applications where the production or repair of high resolution and density features is …

The template-stripping method can yield smooth patterned films without surface
contamination. However, the process is typically limited to coinage metals such as silver and …

2D materials have been intensively studied for almost two decades and are now exhibiting
exceptional properties. Thus, devices that integrate 2D materials offer many novel …

The application of new methods and techniques to fields such as biology and medicine is
becoming more and more demanding since the request of detailed information down to …

Nano-optical devices are raising more and more interest for a variety of applications. From
single molecule detection at high molecular concentration by Fluorescence Correlation …