[图书][B] High dielectric constant materials: VLSI MOSFET applications

H Huff, D Gilmer - 2005 - books.google.com
Issues relating to the high-K gate dielectric are among the greatest challenges for the
evolving International Technology Roadmap for Semiconductors (ITRS). More than just an …
被引用次数：262 相关文章

[图书][B] High Dielectric Constant Materials: VLSI MOSFET Applications

H Huff - 2005 - books.google.com
Issues relating to the high-K gate dielectric are among the greatest challenges for the
evolving International Technology Roadmap for Semiconductors (ITRS). More than just an …

[引用][C] High dielectric constant materials: VLSI mosfet applications

HR Huff, DC Gilmer - (No Title) - cir.nii.ac.jp
High dielectric constant materials : VLSI mosfet applications | CiNii Research CiNii 国立情報学
研究所 学術情報ナビゲータ[サイニィ] 詳細へ移動 検索フォームへ移動 論文・データをさがす 大学 …

High dielectric constant materials: vlsi mosfet applications

HR Huff, DC Gilmer - 2006 - cds.cern.ch
Issues relating to the high-K gate dielectric are among the greatest challenges for the
evolving International Technology Roadmap for Semiconductors (ITRS). More than just an …

High Dielectric Constant Materials VLSI MOSFET Applications

HR Huff, DC Gilmer - Springer
Issues relating to the high-K gate dielectric are among the greatest challenges for the
evolving International Technology Roadmap for Semiconductors (ITRS). More than just an …