Alignment errors from resist coating topography

N Bobroff, A Rosenbluth - Journal of Vacuum Science & Technology B …, 1988 - pubs.aip.org
The registration difficulty associated with a resist‐coated alignment mark depends on the
type of optics used to illuminate and view the wafer alignment aid. The interaction of the light …
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[引用][C] Alignment errors from resist coating topography

N Bobroff, A Rosenbluth - Journal of Vacuum Science …, 1988 - ui.adsabs.harvard.edu
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Alignment errors from resist coating topography

N Bobroff, A Rosenbluth - Journal of Vacuum Science & Technology B …, 1988 - pubs.aip.org
The registration difficulty associated with a resist‐coated alignment mark depends on the
type of optics used to illuminate and view the wafer alignment aid. The interaction of the light …