Annealing effects on the properties of copper oxide thin films prepared by chemical deposition

MR Johan, MSM Suan, NL Hawari, HA Ching - International Journal of …, 2011 - Elsevier
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …
被引用次数：382 相关文章
[PDF] researchgate.net

[PDF][PDF] Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

MR Johan, MSM Suan, NL Hawari… - Int. J. Electrochem …, 2011 - researchgate.net
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …
[PDF] psu.edu

[PDF][PDF] Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

MR Johan, MSM Suan, NL Hawari, HA Ching - Int. J. Electrochem. Sci, 2011 - Citeseer
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …
[PDF] electrochemsci.org

[PDF][PDF] Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

MR Johan, MSM Suan, NL Hawari… - Int. J. Electrochem …, 2011 - electrochemsci.org
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …

Annealing effects on the properties of copper oxide thin films prepared by chemical deposition

MR Johan, MSM Suan, NL Hawari… - International Journal of …, 2010 - eprints.um.edu.my
Copper oxide thin films with thickness of 0.45 mu m were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …

[引用][C] Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

MR Johan, MSM Suan, NL Hawari… - International Journal of …, 2011 - cir.nii.ac.jp
Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical
Deposition | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ移動 …
[PDF] electrochemsci.org

[PDF][PDF] Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

MR Johan, MSM Suan, NL Hawari… - Int. J. Electrochem …, 2011 - electrochemsci.org
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …
[PDF] researchgate.net

[PDF][PDF] Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

MR Johan, MSM Suan, NL Hawari… - Int. J. Electrochem …, 2011 - researchgate.net
Copper oxide thin films with thickness of 0.45 μm were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …

Annealing effects on the properties of copper oxide thin films prepared by chemical deposition

MR Johan, MSM Suan, NL Hawari… - International Journal of …, 2010 - eprints.um.edu.my
Copper oxide thin films with thickness of 0.45 mu m were chemically deposited on glass
substrates by dipping the microscope glass slide for 20 s each in 1 M NaOH and copper …