Atomic layer deposition of Ru thin films using a Ru (0) metallorganic precursor and O2

TE Hong, SH Choi, S Yeo, JY Park… - ECS Journal of Solid …, 2012 - iopscience.iop.org
Ruthenium (Ru) thin films were grown on thermally-grown SiO 2 substrate using atomic
layer deposition (ALD) by a sequential supply of a zero-valent metallorganic …
被引用次数：49 相关文章

Atomic layer deposition of Ru thin films using a Ru (0) metallorganic precursor and O2

TE Hong, SH Choi, S Yeo, JY Park… - ECS Journal of …, 2013 - yonsei.elsevierpure.com
Ruthenium (Ru) thin filmswere grown on thermally-grown SiO 2 substrate using atomic layer
deposition (ALD) by a sequential supply of a zero-valent metallorganic …
[PDF] researchgate.net

[PDF][PDF] Atomic Layer Deposition of Ru Thin Films Using a Ru (0) Metallorganic Precursor and O2

TE Hong, SH Choi, S Yeo, JY Park, SH Kim, T Cheon… - reactions, 2012 - researchgate.net
Ruthenium (Ru) thin films were grown on thermally-grown SiO2 substrate using atomic layer
deposition (ALD) by a sequential supply of a zero-valent metallorganic …