Dynamic finite element analysis of photopolymerization in stereolithography

CP Jiang, YM Huang, CH Liu - Rapid Prototyping Journal, 2006 - emerald.com
Purpose–This paper aims to introduce the principle of the mask exposure and scanning
stereolithography (MESS) and to develop a simulation code to analyze the MESS process …
被引用次数：28 相关文章
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[PDF][PDF] Dynamic finite element analysis of photopolymerization in stereolithography

CP Jiang, YM Huang, CH Liu - Rapid Prototyping Journal, 2006 - scholar.archive.org
Purpose–This paper aims to introduce the principle of the mask exposure and scanning
stereolithography (MESS) and to develop a simulation code to analyze the MESS process …

Dynamic finite element analysis of photopolymerization in stereolithography

CP Jiang, YM Huang, CH Liu - Rapid Prototyping Journal, 2006 - ntut.elsevierpure.com
Purpose-This paper aims to introduce the principle of the mask exposure and scanning
stereolithography (MESS) and to develop a simulation code to analyze the MESS process …

Dynamic finite element analysis of photopolymerization in stereolithography

CP Jiang, YM Huang, CH Liu - Rapid Prototyping Journal, 2006 - hub.hku.hk
Purpose-This paper aims to introduce the principle of the mask exposure and scanning
stereolithography (MESS) and to develop a simulation code to analyze the MESS process …

Dynamic finite element analysis of photopolymerization in stereolithography

CP Jiang, YM Huang, CH Liu - Rapid Prototyping Journal, 2006 - ingentaconnect.com
Purpose‐This paper aims to introduce the principle of the mask exposure and scanning
stereolithography (MESS) and to develop a simulation code to analyze the MESS process …

[引用][C] Dynamic finite element analysis of photopolymerization in stereolithography

J Cho-Pei, H You-Min… - Rapid …, 2006 - Emerald Group Publishing, Limited