A new approach for the fabrication of micromechanical structures
M Parameswaran, HP Baltes, L Ristic, AC Dhaded… - Sensors and …, 1989 - Elsevier
Many inherent features available in the CMOS process lend themselves to the fabrication of
certain micromechanical structures for sensor applications. These micromechanical
structures are fabricated by implementing unconventional layout designs in CMOS
technology without altering the process sequence. A single post-processing etching step is
introduced to form free-standing microstructures on a CMOS IC without affecting the circuitry
formed on the chip, thus allowing micromechanical sensors to be produced with pertinent on …
certain micromechanical structures for sensor applications. These micromechanical
structures are fabricated by implementing unconventional layout designs in CMOS
technology without altering the process sequence. A single post-processing etching step is
introduced to form free-standing microstructures on a CMOS IC without affecting the circuitry
formed on the chip, thus allowing micromechanical sensors to be produced with pertinent on …