Active screen plasma nitriding is a new and common method for deposition of Iron nitride.
Since techniques such as Chemical Vapor Deposition (CVD), Physical Vapor Deposition
(PVD) and Plasma Assisted Chemical Vapor Deposition (PACVD) are usually applied in
order to deposit the titanium nitride and each of these methods has its own problems, in this
research active screen plasma nitriding method was introduced as a novel approach for
deposition of nano sized titanium nitride. H11 tool steel samples were coated by plasma …