A photolithographic process for fabrication of devices with isolated single-walled carbon nanotubes
Nanotechnology, 2004•iopscience.iop.org
We have successfully fabricated devices with isolated single-walled carbon nanotubes
(SWNTs) using exclusively standard i-line (365 nm) photolithography. Catalyst islands were
patterned with an SU-8-photoresist-based process. This method provides well-defined
islands, down to 1 µm in size. The islands are clearly visible with an optical microscope and
are used as alignment marks for optical alignment of subsequent layers. SWNTs were grown
by chemical vapour deposition (CVD). Contacts to the nanotubes were fabricated by …
(SWNTs) using exclusively standard i-line (365 nm) photolithography. Catalyst islands were
patterned with an SU-8-photoresist-based process. This method provides well-defined
islands, down to 1 µm in size. The islands are clearly visible with an optical microscope and
are used as alignment marks for optical alignment of subsequent layers. SWNTs were grown
by chemical vapour deposition (CVD). Contacts to the nanotubes were fabricated by …
Abstract
We have successfully fabricated devices with isolated single-walled carbon nanotubes (SWNTs) using exclusively standard i-line (365 nm) photolithography. Catalyst islands were patterned with an SU-8-photoresist-based process. This method provides well-defined islands, down to 1 µm in size. The islands are clearly visible with an optical microscope and are used as alignment marks for optical alignment of subsequent layers. SWNTs were grown by chemical vapour deposition (CVD). Contacts to the nanotubes were fabricated by standard photolithography.
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