The increasingly complex nanoscale three-dimensional and multilayered structures utilized
in nanoelectronic, catalytic, and energy conversion/storage devices necessitate novel
substrate-selective material deposition approaches featuring bottom-up and self-aligned
precision processing. Here, we demonstrate the area-selective atomic layer deposition (AS-
ALD) of two noble metals, Pt and Pd, by using a plasma-polymerized fluorocarbon layer as
growth inhibition surfaces. The contact angle, x-ray photoelectron spectroscopy (XPS), and …

Selective deposition is a powerful self-aligned precision materials processing strategy which
can hugely benefit next-generation nanoelectronics, catalysis, and energy
conversion/storage fields. Atomic layer deposition (ALD) is showing a significant promise in
enabling area-selective deposition using various growth blocking layers including self-
assembled monolayers (SAMs) and various polymers. However, these blocking layers are
not compatible with energetic co-reactants like ozone and plasma radicals, showing …