scalable fabrication. In the age of quantum technology, however, the metrics that crowned
Si/SiO2 as the microelectronics standard need to be reassessed with respect to their impact
upon qubit performance. We chart spin qubit variability due to the unavoidable atomic-scale
roughness of the Si/SiO2 interface, compiling experiments across 12 devices, and develop
theoretical tools to analyse these results. Atomistic tight binding and path integral Monte …