Characterization of a TiO2 Photocatalyst Film Deposited by CVD and Its Photocatalytic Activity

SC Jung, BH Kim, SJ Kim, N Imaishi… - Chemical Vapor …, 2005 - Wiley Online Library
TiO2 photocatalyst films were prepared by low‐pressure metal–organic (LPMO) CVD, with
varying reaction temperatures and deposition times, using titanium tetra‐isopropoxide
(TTIP). Firstly, the characteristics of the CVD preparation of TiO2 films, as a function of the
CVD reaction temperature and deposition time, were studied experimentally. Secondly, the
photocatalytic activities of TiO2 films were evaluated by the decomposition rate of methylene
blue in aqueous solution using a photo‐reactor. The results indicated that film thickness was …

Characterization of a TiO2 Photocatalyst Film Deposited by CVD and Its Photocatalytic Activity

YI Cho, BH Kim, SJ Kim, SC Jung… - Chemical Vapor Deposition, 2005 - cir.nii.ac.jp
TiO 2 photocatalyst films were prepared by low-pressure metal-organic (LPMO) CVD, with
varying reaction temperatures and deposition times, using titanium tetra-isopropoxide
(TTIP). Firstly, the characteristics of the CVD preparation of TiO 2 films, as a function of the
CVD reaction temperature and deposition time, were studied experimentally. Secondly, the
photocatalytic activities of TiO 2 films were evaluated by the decomposition rate of
methylene blue in aqueous solution using a photo-reactor. The results indicated that film …
以上显示的是最相近的搜索结果。 查看全部搜索结果