Metal-catalyst-free chemical vapor deposition (CVD) of large area uniform nanocrystalline
graphene on oxidized silicon substrates is demonstrated. The material grows slowly,
allowing for thickness control down to monolayer graphene. The as-grown thin films are
continuous with no observable pinholes, and are smooth and uniform across whole wafers,
as inspected by optical-, scanning electron-, and atomic force microscopy. The sp 2
hybridized carbon structure is confirmed by Raman spectroscopy. Room temperature …