Dense plasma focus energetic ions based fullerene films on a Si (111) substrate
The highly energetic and high fluence argon ions emitted in a dense plasma focus device
have been used for the first time to get fullerene films by ablating the graphite target such
that the ablated material is deposited on a Si (111) substrate. These films have been studied
using XRD, high resolution transmission electron microscopy (HRTEM), Raman
spectroscopy, FTIR spectroscopy and SEM microscopy. The XRD, Raman and FTIR spectra
show peaks corresponding to fullerenes, mainly C60 and C70. Moreover, prominent peaks …
have been used for the first time to get fullerene films by ablating the graphite target such
that the ablated material is deposited on a Si (111) substrate. These films have been studied
using XRD, high resolution transmission electron microscopy (HRTEM), Raman
spectroscopy, FTIR spectroscopy and SEM microscopy. The XRD, Raman and FTIR spectra
show peaks corresponding to fullerenes, mainly C60 and C70. Moreover, prominent peaks …
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