Effect of 193 and 157 nm laser light illumination on the surface properties of TMOS–NiCl2 sol–gel derived material

L Athanasekos, Z Kollia, M Vasileiadis… - Journal of …, 2010 - iopscience.iop.org
L Athanasekos, Z Kollia, M Vasileiadis, N Aspiotis, D Alexandropoulos, A Meristoudi…
Journal of Optics, 2010iopscience.iop.org
Sol–gel tetramethoxyorthosilicate (TMOS) derived composite thin films comprising
embedded NiCl 2 nanoparticles, were illuminated and processed by 193 and 157 nm
excimer laser radiation. The effect of different laser fluences of 193 nm and the number of
157 nm pulses on the material surface was studied. Atomic force microscopy imaging was
used to evaluate the effects of the irradiation. It was found that surface morphology was
modified in a controllable way, with physical and chemical properties strongly depending on …
Abstract
Sol–gel tetramethoxyorthosilicate (TMOS) derived composite thin films comprising embedded NiCl 2 nanoparticles, were illuminated and processed by 193 and 157 nm excimer laser radiation. The effect of different laser fluences of 193 nm and the number of 157 nm pulses on the material surface was studied. Atomic force microscopy imaging was used to evaluate the effects of the irradiation. It was found that surface morphology was modified in a controllable way, with physical and chemical properties strongly depending on the illumination conditions. Ablative ultraviolet laser surface processing is a generic single-step approach that can be applied successfully in composite materials. Applications involve micro/nanostructure formation for use in hybrid photonic and optoelectronic devices and other applications.
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