Electrical transport properties of p-GaN

H Nakayama, P Hacke, MRH Khan… - Japanese journal of …, 1996 - iopscience.iop.org
H Nakayama, P Hacke, MRH Khan, T Detchprohm, KHK Hiramatsu, NSN Sawaki
Japanese journal of applied physics, 1996iopscience.iop.org
Electrical transport properties of Mg-doped p-GaN grown by organometallic vapor phase
epitaxy were studied between 100 and 700 K. Calculations using Fermi-Dirac statistigs were
carried out, identifying the majority carrier to be holes over the whole temperature range
considered. The acceptor level is 0.17±0.01 eV. The hole mobility is 10 cm 2/V· s and is
almost temperature independent from 160 to 300 K. The detailed analysis employing Fermi-
Dirac statistics was then extended to determine the temperature dependence of the Fermi …
Abstract
Electrical transport properties of Mg-doped p-GaN grown by organometallic vapor phase epitaxy were studied between 100 and 700 K. Calculations using Fermi-Dirac statistigs were carried out, identifying the majority carrier to be holes over the whole temperature range considered. The acceptor level is 0.17±0.01 eV. The hole mobility is 10 cm 2/V· s and is almost temperature independent from 160 to 300 K. The detailed analysis employing Fermi-Dirac statistics was then extended to determine the temperature dependence of the Fermi level.
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