New anti-reflective or fill compositions having improved flow properties are provided. The
compositions comprise a dendritic polymer dispersed or dissolved in a solvent system, and
preferably a light attenuating compound, a crosslinking agent, and a catalyst. The inventive
compositions can be used to protect contact or via holes from degradation during
subsequent etching in the dual damascene process. The inventive compositions can also be
applied to substrates (eg, silicon wafers) to form anti-reflective coating layers having high …

… Gap fill materials and bottom anti-reflective coatings comprising hyperbranched polymers
Download PDF … US11/032,930 Division US7754818B2 (en) 2005-01-11 2005-01-11 Gap
fill materials and bottom anti-reflective coatings comprising hyperbranched polymers …
US11/032,930 Active 2025-11-17 US7754818B2 (en) 2005-01-11 2005-01-11 Gap fill
materials and bottom anti-reflective coatings comprising hyperbranched polymers …