In this work, we investigated the effect of the deposition potential on the morphological,
structural, and optical properties of Cu2O thin films prepared on FTO-coated glass
substrates. The potentials of the electrodeposition are-0.3 V,-0.4 V,-0.5 V. The deposition
potentials were optimized by cyclic voltammetry experiment for a slow scan rate of 20mV/s. It
has been found that the potential of electrodeposition has a significant influence on the
Cu2O thin films. X-ray diffraction revealed that all thin films are crystallized in cubic phase for …