High-Resolution Graphene Films for Electrochemical Sensing via Inkjet Maskless Lithography

JA Hondred, LR Stromberg, CL Mosher, JC Claussen - ACS nano, 2017 - ACS Publications
Solution-phase printing of nanomaterial-based graphene inks are rapidly gaining interest for
fabrication of flexible electronics. However, scalable manufacturing techniques for high-
resolution printed graphene circuits are still lacking. Here, we report a patterning technique
[ie, inkjet maskless lithography (IML)] to form high-resolution, flexible, graphene films (line
widths down to 20 μm) that significantly exceed the current inkjet printing resolution of
graphene (line widths∼ 60 μm). IML uses an inkjet printed polymer lacquer as a sacrificial …

High resolution graphene films for electrochemical sensing via inkjet maskless lithography

J Claussen, J Hondred, L Stromberg - US Patent 10,875,339, 2020 - Google Patents
2018-10-17 Assigned to IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC.
reassignment IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC. ASSIGNMENT
OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CLAUSSEN,
Jonathan, HONDRED, JOHN, STROMBERG, LOREEN
以上显示的是最相近的搜索结果。 查看全部搜索结果

Google学术搜索按钮

example.edu/paper.pdf
搜索
获取 PDF 文件
引用
References