(MTJs), we observe an increase in maximum tunneling magnetoresistance (TMR) from 65%
up to 138%. It's found that decreasing the Ta deposition rate in Ta/Ru/Ta underlayers allows
for greater annealing temperatures (up to 350) while still maintaining a perpendicular easy
axis. An improvement is also seen at a lower temperature where both seedlayers maintain a
perpendicular FeCoB easy axis indicating that the increase in TMR is not solely related to …