Investigation of the depletion layer by scanning capacitance force microscopy with Kelvin probe force microscopy

T Uruma, N Satoh, H Yamamoto - Japanese Journal of Applied …, 2016 - iopscience.iop.org
T Uruma, N Satoh, H Yamamoto
Japanese Journal of Applied Physics, 2016iopscience.iop.org
We have developed a scanning probe microscope (SPM) that combines atomic force
microscopy (AFM) with both Kelvin probe force microscopy (KFM—to measure the surface
potential) and scanning capacitance force microscopy (SCFM—to measure the differential
capacitance). The surface physical characteristics of a commercial Si Schottky barrier diode
(Si-SBD), with and without an applied reverse bias, were measured over the same area by
our AFM/KFM/SCFM system. We thus investigated the discrete power device by calculating …
Abstract
We have developed a scanning probe microscope (SPM) that combines atomic force microscopy (AFM) with both Kelvin probe force microscopy (KFM—to measure the surface potential) and scanning capacitance force microscopy (SCFM—to measure the differential capacitance). The surface physical characteristics of a commercial Si Schottky barrier diode (Si-SBD), with and without an applied reverse bias, were measured over the same area by our AFM/KFM/SCFM system. We thus investigated the discrete power device by calculating the depletion-layer width and drawing an energy-band diagram.
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