Carbon–metal composite thin films were synthesized by a hybrid process combining
magnetron sputtering and PECVD in an argon–methane plasma. Titanium was chosen as
the target metal. The paper is focused on the impact of three types of deposition process (DC
magnetron, RF magnetron or Ionized Physical Vapour Deposition–IPVD) on thin films'
deposition and microstructure. The effect of the methane fraction in gas discharge was also
studied. Films were analysed by EDX, XPS and XRD. Results indicate steady deposition …