coatings at a substrate temperature of 900° C by combinatorial magnetron sputtering. This
synthesis temperature limits the choice of substrate materials severely. Here, utilizing high
power pulsed magnetron sputtering (HPPMS), the synthesis temperature was reduced to
380° C, while the measured elastic modulus and lattice parameters of the as-deposited films
are consistent with ab-initio data. Since the crystallization of amorphous Mo 2 BC powder …