violet and visible spectral regions with aluminum oxide (Al2O3) films using an atomic layer
deposition (ALD) process. Alumina films were deposited on glass and fused silica substrates
by the ALD process at substrate/chamber temperatures of 200° C and 300° C. Transmission
spectra and waveguide measurements were performed in our alumina films with
thicknesses in the range of 210–380nm for the optical characterization. Those …