Magnetic behavior of lithographically patterned particle arrays
CA Ross, S Haratani, FJ Castano, Y Hao… - Journal of applied …, 2002 - pubs.aip.org
This article reviews recent progress in the fabrication, characterization, and analysis of large
area arrays of sub-100-nm magnetic particles made by lithographic techniques. Particles are
made by electrodeposition, evaporation and liftoff, or sputtering and etching, leading to a
wide range of shapes, compositions, and microstructures. The remanent states, magnetic
hysteresis, and uniformity of the particles and the interparticle interactions will be
discussed.© 2002 American Institute of Physics. DOI: 10.1063/1.1452247
area arrays of sub-100-nm magnetic particles made by lithographic techniques. Particles are
made by electrodeposition, evaporation and liftoff, or sputtering and etching, leading to a
wide range of shapes, compositions, and microstructures. The remanent states, magnetic
hysteresis, and uniformity of the particles and the interparticle interactions will be
discussed.© 2002 American Institute of Physics. DOI: 10.1063/1.1452247
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