Study of gas-phase chemistry in a hot-wire chemical vapor deposition reactor with trimethylsilane and hexamethyldisilane

B Eustergerling, X Li, Y Shi - APS Division of Atomic …, 2007 - ui.adsabs.harvard.edu
Gas-phase chemistry involved in the decomposition of trimethylsilane and
hexamethyldisilane (HMDS) on a hot tungsten filament and the secondary gas-phase
reactions in a HWCVD reactor has been studied using vacuum ultraviolet laser single
photon ionization in tandem with TOF-MS. On the hot W filament, trimethylsilane is
decomposed into (CH 3) 2 HSi and CH 3 radicals and HMDS is decomposed into (CH 3) 5
Si 2, CH 3, and (CH 3) 3 Si radicals. Biradical combination reactions among primary radicals …

Mass spectrometric study of gas-phase chemistry in a hot-wire chemical vapor deposition reactor with tetramethylsilane

XM Li, BD Eustergerling, YJ Shi - International Journal of Mass …, 2007 - Elsevier
To understand the gas-phase chemistry in the processes of hot-wire chemical vapor
deposition (HWCVD) with tetramethylsilane (TMS), the gas-phase products from the
decomposition of TMS on a hot tungsten filament and the secondary gas-phase reactions in
a HWCVD reactor have been studied using vacuum ultraviolet laser single photon ionization
time-of-flight mass spectrometry. It is found that TMS decomposes on the filament to methyl
and trimethylsilyl radicals. Subsequent reactions between these two primary radicals and …
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