Systems and methods of reducing outgassing of a Substance within a reaction chamber of a
reactor are disclosed. Exem plary methods include depositing a barrier layer within the
reaction chamber and using a scavenging precursor to react with species on a Surface of
the reaction chamber. Exemplary systems include gas-phase deposition systems, such as
atomic layer deposition systems, which include a barrier layer Source and/or a scavenging
precursor source fluidly coupled to a reaction chamber of the system.

4, 181, 330 A 4, 194, 536 A 4, 322, 592 A 4, 389, 973 A 4, 393, 013 A 4, 401, 507 A 4, 414,
492 A 4, 436, 674 A 4, 479, 831 A 4, 499, 354 A 4, 512, 113 A 4, 570, 328 A 4, 579, 623 A
D288, 556 S 4, 653, 541 A 4, 654, 226 A 4, 681, 134 A 4, 718, 637 A 4, 722, 298 A 4, 735,
259 A 4, 753, 192 A 4, 756, 794 A 4, 780, 169 A 4, 789, 294 A 4, 821, 674 A 4, 827, 430 A 4,
837, 185 A 4, 854, 263 A 4, 857, 139 A 4, 857, 382 A 4, 882, 199 A 4, 976, 996 A 4, 978, 567
A 4, 984, 904 A 4, 985, 114 A