The present invention provides methods and devices for fab ricating 3D structures and
patterns of 3D structures on sub strate Surfaces, including symmetrical and asymmetrical pat
terns of 3D structures. Methods of the present invention provide a means of fabricating 3D
structures having accu rately selected physical dimensions, including lateral and vertical
dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect,
methods are provided using a mask element comprising a conformable, elastomeric phase …

The present invention provides methods and devices for fabricating 3D structures and
patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical
patterns of 3D structures. Methods of the present invention provide a means of fabricating
3D structures having accurately selected physical dimensions, including lateral and vertical
dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect,
methods are provided using a mask element comprising a conformable, elastomeric phase …