Molecular glass resist performance for nano-pattern transfer
Z El Otell, A Ringk, T Kolb, C Neuber… - … Etch Technology for …, 2015 - spiedigitallibrary.org
Z El Otell, A Ringk, T Kolb, C Neuber, L Hansel, JF de Marneffe
Advanced Etch Technology for Nanopatterning IV, 2015•spiedigitallibrary.orgThe performance of novel molecular glass resists is demonstrated in this work for the
purposes of performing nano-pattern transfer. In order to improve the etch durability, post
apply bake (PAB) and mixing two resists platforms were investigated. These resists showed
a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate,
surface roughness, evolution of the refractive index of these materials are presented to
establish a good baseline and select appropriate candidate materials for patterning beyond …
purposes of performing nano-pattern transfer. In order to improve the etch durability, post
apply bake (PAB) and mixing two resists platforms were investigated. These resists showed
a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate,
surface roughness, evolution of the refractive index of these materials are presented to
establish a good baseline and select appropriate candidate materials for patterning beyond …
The performance of novel molecular glass resists is demonstrated in this work for the purposes of performing nano-pattern transfer. In order to improve the etch durability, post apply bake (PAB) and mixing two resists platforms were investigated. These resists showed a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate, surface roughness, evolution of the refractive index of these materials are presented to establish a good baseline and select appropriate candidate materials for patterning beyond-CMOS.
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