Nano-structured Fe thin film deposition using plasma focus device

RS Rawat, T Zhang, KST Gan, P Lee… - Applied Surface …, 2006 - Elsevier
RS Rawat, T Zhang, KST Gan, P Lee, RV Ramanujan
Applied Surface Science, 2006Elsevier
This paper reports the deposition of nano-structured Fe thin films using 3.3 kJ Mather-type
plasma focus. The conventional hollow copper anode was replaced by anode fitted with
solid Fe top and the deposition was done using different numbers of deposition shots at two
different angular positions. Scanning Electron Microscopy shows that the size of nano-phase
agglomerate is smaller when the sample is deposited using either lesser number of
deposition shots or at higher angular position with respect to anode axis. X-ray Diffraction …
This paper reports the deposition of nano-structured Fe thin films using 3.3kJ Mather-type plasma focus. The conventional hollow copper anode was replaced by anode fitted with solid Fe top and the deposition was done using different numbers of deposition shots at two different angular positions. Scanning Electron Microscopy shows that the size of nano-phase agglomerate is smaller when the sample is deposited using either lesser number of deposition shots or at higher angular position with respect to anode axis. X-ray Diffraction shows that crystal structure characteristics change with increase in number of deposition shots. Measurements of magnetic properties using Vibrating Sample Magnetometer identify intermediate magnetization and coercivity in Fe thin films deposited at smaller angular position with respect to anode axis. It is concluded that the morphological, structural and magnetic characteristics of Fe thin films deposited using plasma focus device depend not only on the number of focus deposition shots but also on the angular position of the sample.
Elsevier
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