A nanoelectromechanical mass sensor (NEMS) was used to characterize material
deposition rates in stencil lithography. The local material deposition on the sensor surface
was modeled and compared with the experimental measurements employing the sensor.
The model was tested with experimental data obtained by displacing the stencil laterally in a
given direction while monitoring the change of resonance frequency of the sensor.
Assuming that the change of resonance frequency depends linearly on the deposited mass …

Shadow masking (also known as nanostencil lithography, SL) is a well known technique to
fabricate patterns on a surface. It is a versatile method that can be used in a variety of
applications. There has been recently a strong interest regarding the use of shadow masks,
mostly related to combinatorial materials science, organic based device fabrication, as well
as rapid prototyping of nanoscale structures using dynamic or quasi dynamic stencil
deposition [1]. From the study of almost all reported variants of SL, a series of intrinsic …