Numerical simulations for a quantitative analysis of AFM electrostatic nanopatterning on PMMA by Kelvin force microscopy
Electrostatic nanopatterning of electret thin films by atomic force microscopy (AFM) has
emerged as an alternative efficient tool for the directed assembly of nano-objects on
surfaces. High-resolution charge imaging of such charge patterns can be performed by AFM-
based Kelvin force microscopy (KFM). Nevertheless, quantitative analysis of KFM surface
potential mappings is not trivial because of side-capacitance effects induced by the tip cone
and the cantilever of the scanning probe.
emerged as an alternative efficient tool for the directed assembly of nano-objects on
surfaces. High-resolution charge imaging of such charge patterns can be performed by AFM-
based Kelvin force microscopy (KFM). Nevertheless, quantitative analysis of KFM surface
potential mappings is not trivial because of side-capacitance effects induced by the tip cone
and the cantilever of the scanning probe.
Abstract
Electrostatic nanopatterning of electret thin films by atomic force microscopy (AFM) has emerged as an alternative efficient tool for the directed assembly of nano-objects on surfaces. High-resolution charge imaging of such charge patterns can be performed by AFM-based Kelvin force microscopy (KFM). Nevertheless, quantitative analysis of KFM surface potential mappings is not trivial because of side-capacitance effects induced by the tip cone and the cantilever of the scanning probe.
iopscience.iop.org
以上显示的是最相近的搜索结果。 查看全部搜索结果