Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties
T Schwarz-Selinger, A Von Keudell… - Journal of Applied …, 1999 - pubs.aip.org
Hydrocarbon films were prepared by electron cyclotron resonance plasma deposition from
different hydrocarbon source gases at varying ion energies. The source gases used were
the saturated hydrocarbons CH 4, C 2 H 6, C 3 H 8, C 4 H 10 (n-and iso-) and the
unsaturated hydrocarbons C 2 H 4 and C 2 H 2 as well as mixtures of these gases with
hydrogen. Film deposition was analyzed in situ by real-time ellipsometry, and the resulting
films ex situ by ion-beam analysis. On the basis of the large range of deposition parameters …
different hydrocarbon source gases at varying ion energies. The source gases used were
the saturated hydrocarbons CH 4, C 2 H 6, C 3 H 8, C 4 H 10 (n-and iso-) and the
unsaturated hydrocarbons C 2 H 4 and C 2 H 2 as well as mixtures of these gases with
hydrogen. Film deposition was analyzed in situ by real-time ellipsometry, and the resulting
films ex situ by ion-beam analysis. On the basis of the large range of deposition parameters …