Pressure dependence of (Ti, Al) N film growth on inner walls of small holes in high-power impulse magnetron sputtering
T Shimizu, H Komiya, Y Teranishi, K Morikawa… - Thin Solid Films, 2017 - Elsevier
Abstract (Ti, Al) N films were deposited inside 1 mm scale small holes from a Ti 0.33 Al 0.67
alloy target by high-power impulse magnetron sputtering (HiPIMS). To investigate the
transport behavior of sputtered and gas species of ternary nitride into the small hole
structure and its effect on the chemical and phase compositions of the films grown on the
inner side walls, the deposition was performed under inert working gas pressures of 0.5, 1,
and 2 Pa with a fixed pulse length of 50 μs and a frequency of 1 kHz. Optical emission …
alloy target by high-power impulse magnetron sputtering (HiPIMS). To investigate the
transport behavior of sputtered and gas species of ternary nitride into the small hole
structure and its effect on the chemical and phase compositions of the films grown on the
inner side walls, the deposition was performed under inert working gas pressures of 0.5, 1,
and 2 Pa with a fixed pulse length of 50 μs and a frequency of 1 kHz. Optical emission …
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