RBS and NRA analysis for films with high growth rate prepared by atomic layer deposition
B Xia, JJ Ganem, S Steydli, H Tancrez… - Nuclear Instruments and …, 2021 - Elsevier
We present the design and operation of a specialized Atomic Layer Deposition (ALD)
system, dedicated to stable isotopic tracing experiments of oxide film growth, using
isotopically labelled water as the oxide reactant. A small chamber volume allows operation
with only very small quantities of water vapor, minimising the consumption of the isotopically
labelled water. The first results for growth of ZnO and TiO 2 using Diethlyzinc (DEZ) and
Tetrakis (dimethylamino) titanium (TDMAT) as the zinc and titanium precursors, and …
system, dedicated to stable isotopic tracing experiments of oxide film growth, using
isotopically labelled water as the oxide reactant. A small chamber volume allows operation
with only very small quantities of water vapor, minimising the consumption of the isotopically
labelled water. The first results for growth of ZnO and TiO 2 using Diethlyzinc (DEZ) and
Tetrakis (dimethylamino) titanium (TDMAT) as the zinc and titanium precursors, and …
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