… image onto resists, and therefore have been labeled next generation lithography (NGL). …
the sensitivity of resists, the increased sensitivity can come with lithographic penalties in other …

… Resist chemistry for next-generation lithography is likely to be quite distinct from the well-…
to resist chemistry in EUV and electron beam lithography, alongside a review of current resist …

… next generation lithography (NGL), we have selected a different host polymer matrix, the
KRS-XE ® chemically amplified e-beam resist … the KRS-XE ® resist. The compatibility between …

… Resists for X-ray lithography can be similar to those used today for DUV optical lithography
although exposure sensitivity is somewhat lower than what is needed for high wafer …

… resist materials will be required to break the RLS trade-off relationship. In addition, the
next-generation resists … the potential next-generation lithography techniques has been provided. …

… resist materials by energetic beams, nanoimprint lithography (NIL) replicates nanostructures
by embossing a resist… required specifications for mold and resist materials. NIL methods with …

… This study also presents a detailed lithographic evaluation of phenolic MG resists. T-BOC …
tone resists and phenolic MGs with a crosslinker were evaluated as negative tone resists. An …

… We report initial results for a nanocomposite resist material for possible NGL technologies,
based on 248 nm lithography results. These new materials exhibit enhanced lithographic …

… the electron beam behavior in the resist material, and by modifying the resist to obtain the …
lithography, the resist was developed in hexane for 10 s to dissolve away the unexposed resist…

… For this reason, we decided to investigate non-chemically amplified molecular glass resist
systems for next generation lithography. In the next section, we report our preliminary results. …