Structural properties of zinc oxide thin films prepared by rf magnetron sputtering
R Ondo-Ndong, F Pascal-Delannoy, A Boyer… - Materials Science and …, 2003 - Elsevier
ZnO thin films were deposited on sapphire, glass and silicon substrates by rf magnetron
sputtering using metallic zinc target. A systematic study has been made of the influence of
substrate temperature on the film structural properties. They exhibited a c-axis orientation of
below 0.5° full width at half maximum of X-ray rocking curves, an extremely high resistivity of
1010 Ωcm and an energy gap of 3.3 eV at room temperature. It was found that a substrate
temperature of 100° C and target/substrate distance about 50 mm, very low gas pressures of …
sputtering using metallic zinc target. A systematic study has been made of the influence of
substrate temperature on the film structural properties. They exhibited a c-axis orientation of
below 0.5° full width at half maximum of X-ray rocking curves, an extremely high resistivity of
1010 Ωcm and an energy gap of 3.3 eV at room temperature. It was found that a substrate
temperature of 100° C and target/substrate distance about 50 mm, very low gas pressures of …
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