In this paper, we report the potential of the doping-less (DL) double gate field effect transistor (DL-DGFET), for ultra low power (ULP) subthreshold logic applications. We demonstrated that the proposed DL-DGFET do not require any doping from source to drain region and it can perform significantly better than highly doped junctionless (JL) and abrupt S/D inversion-mode (IM) DGFETs. The DL-DGFET achieves 1.8X and 2.75X cutoff frequency (f T ), 1.7X and 3X maximum frequency of oscillation (f MAX ) along with 10.5 and 18.6 dB improvement in intrinsic voltage gain (A VO ) in comparison to conventional JL and non-underlap FETs, respectively. Simulation results revealed that the DL-DGFET alleviates the inherent trade-off between gain and bandwidth of nanodevices by 6X improvement in gain frequency product (GFP) over highly doped JL-DGFET due to significant reduction in parasitic capacitances.