Thermal conductivity reduction at inorganic–organic interfaces: from regular superlattices to irregular gradient layer sequences
Nanoscale superlattice structures are known to significantly suppress the thermal
conductivity in thin films due to phonon scattering at the interfaces of the mutually different
layers. Here it is demonstrated that in addition to the number of interfaces, their spacing
within the film can lead to a reduction in thermal conductivity. The proof‐of‐concept data are
for ZnO/benzene thin films fabricated through sequential gas‐surface reactions in
atomic/molecular layer precision using the atomic/molecular layer deposition technique. In …
conductivity in thin films due to phonon scattering at the interfaces of the mutually different
layers. Here it is demonstrated that in addition to the number of interfaces, their spacing
within the film can lead to a reduction in thermal conductivity. The proof‐of‐concept data are
for ZnO/benzene thin films fabricated through sequential gas‐surface reactions in
atomic/molecular layer precision using the atomic/molecular layer deposition technique. In …
Thermal Conductivity Reduction at Inorganic-Organic Interfaces
Nanoscale superlattice structures are known to significantly suppress the thermal
conductivity in thin films due to phonon scattering at the interfaces of the mutually different
layers. Here it is demonstrated that in addition to the number of interfaces, their spacing
within the film can lead to a reduction in thermal conductivity. The proof-of-concept data are
for ZnO/benzene thin films fabricated through sequential gas-surface reactions in
atomic/molecular layer precision using the atomic/molecular layer deposition technique. In …
conductivity in thin films due to phonon scattering at the interfaces of the mutually different
layers. Here it is demonstrated that in addition to the number of interfaces, their spacing
within the film can lead to a reduction in thermal conductivity. The proof-of-concept data are
for ZnO/benzene thin films fabricated through sequential gas-surface reactions in
atomic/molecular layer precision using the atomic/molecular layer deposition technique. In …
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