Water-rich conditions during titania atomic layer deposition in the 100° C-300° C temperature window produce films with TiIV oxidation state but large H and O content …

B Xia, JJ Ganem, I Vickridge, E Briand, S Steydli… - Applied Surface …, 2022 - Elsevier
Titania films prepared by atomic layer deposition attract great attention due to the
widespread application of the oxide as a photocatalytic material, or more recently, as a
promising charge storage material for lithium or proton batteries. We implement here
advanced tools (Ion Beam Analysis and X-ray Photoelectron Spectroscopy, aided by
Ellipsometry and X-ray Diffraction) to characterize films grown in the 100° C-300° C
temperature window, using tetrakis (dimethylamino) titanium (TMDAT) as the metal …

Water-Rich Conditions During Titania Atomic Layer Deposition in the 100° C-300° C Temperature Window Produce Films with Tiiv Oxidation State But Large H and O …

F Rochet, B Xia, JJ Ganem, I Vickridge… - Available at SSRN … - papers.ssrn.com
Titania films prepared by atomic layer deposition attract great attention due to the
widespread application of the oxide as a photocatalytic material, or more recently, as a
promising charge storage material for lithium or proton batteries. We implement here
advanced tools (Ion Beam Analysis and X-ray Photoelectron Spectroscopy, aided by
Ellipsometry and X-ray Diffraction) to characterize films grown in the 100 C-300 C
temperature window, using tetrakis (dimethylamino) titanium (TMDAT) as the metal …
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