Zinc Oxide (ZnO) photoanode has attracted great attention due to its favorable electronic and optical properties. The deposition of ZnO films using the ultrasonic-assisted successive ionic layer adsorption and reaction (SILAR) method has been done successfully on fluorine-doped tin oxide and glass substrates at various dipping cycles. The structural, morphological, and optical properties as well as the DSSC performance of the ZnO photoanodes were investigated. The ultrasonication process is used to enhance the compactness, crystallinity, shape, and size of the prepared ZnO films. The fabricated DSSC device with 150 SILAR cycles shows the highest efficiency of 0.78% with a J SC of 4.56 mA/cm2, V OC of 0.45 V, and FF of 0.38. The joint employment of the SILAR-dipping and ultrasonication process provided an effective way to prepare excellent photoanodes for DSSC application.