HK Jung, YS Hwang, IJ Hyeon, YK Kim… - 2008 3rd IEEE …, 2008 - ieeexplore.ieee.org
… fusedquartz using a C4F8/He gas mixture with the polysilicon film and bonded silicon wafer as an etch … The SEM image of the DRIE-etchedfusedquartz microstructures is shown in Fig. …
… In this paper, the fabricationof fusedquartz microchips is … below themelting temperature of fusedquartz. A simple cross channel … , wet chemicaletching and bonding techniques.14 First, …
L Meng, Y Liu, Y Yan, D Guo, P Zhou - Precision Engineering, 2024 - Elsevier
… induced chemicaletching (ECICE) as a method to achieve nanogram-level, low-cost, stress-free, and stable material removal of fusedquartz. A modeling analysis of the etching process …
… Glass and fused-quartz are commonly used in … their chemical inertness and optical transparency. This study focuses on the etching of glass and fused-quartz using chemicaletching …
Q Li, Y Zhang, Z Shi, W Li, X Ye - Coatings, 2023 - mdpi.com
… Quartz crystals are chemically identical to fusedquartz, both being SiO 2 . fusedquartz is … This is mainly because RIE etching involves both physical and chemicaletching processes. …
YS Hwang, HK Jung, ES Song, IJ Hyeon… - 2009 IEEE 22nd …, 2009 - ieeexplore.ieee.org
… The SEM image of the etched 50-gm-thick fusedquartz microstructures is shown in Fig. Almost vertical profile angle is achieved by using the aboveprocess conditions. …
ES Song, S Kang, H Kim, YK Kim… - IEEE Electron Device …, 2013 - ieeexplore.ieee.org
… driven fused-quartz micro… of fusedquartz are beneficial. Further improvement of the device Q would be expected if we could improve the etch precision with surface quality of quartz …
Y Huo, Z Wei, S Ren, G Yi - IEEE Transactions on Industrial …, 2022 - ieeexplore.ieee.org
… method for fusedquartz hemispherical resonator based on the ion beam etching process is … The 3rd stage: The chemicaletching is used again to improve the quality factor to more than …
M Pedersen, M Huff - Journal of Microelectromechanical …, 2017 - ieeexplore.ieee.org
… process recipe for the plasma etching of deep high-aspect ratio features into fused silica (fused quartz) material using an inductively coupled plasma reactive-ion etch process. As part of …