… the Porous germanium Efficient Epitaxial LayEr Release (PEELER) process for wafer-scale
growth of … This approach consists of four key steps: (i) wafer-scale porosification by bipolar …

… nanomembranes is qualitatively different from the Smart Cut (ie, ion-cutting) process of
transferring thin layers to a new host substrate on the wafer scale. … and germanium wafer bonding …

Silicon (Si) and/or germanium (Ge) nanomembranes (NMs) play crucial roles in various
applications, including conventional microelectronics, as well as recently emerging high-…

… The SiGe NM is transferred to a new host substrate (in this work an oxidized Si wafer) and
bonded there before a lattice matched SiGe buffer layer and strained-Si QW are epitaxially …

… scale (for example, wafer scale), which is superior to current 2D material–based optoelectronic
devices and can be a competitive building block for next-generation functional electronic/…

… This work demonstrates large-area self-supporting Ge nanomembranes and provides an
empirical guide for their synthesis. The process applies dry etching with ICP-RIE fluorine-based …

… in polymeric films are developed on Ge nanomembranes using direct membrane assembly.
… These results show that ultrathin nanomembrane active layers can be effectively coupled to …

… Germanium (Ge) substrates are employed for III-V … Ge nanomembranes (NMs) are gaining
attention to reduce Ge consumption through substrate reuse. The Porous germanium Efficient …

… planar photodetectors using flat germanium nanomembranes. Furthermore, … germanium
nanomembranes into the field of flexible/wearable optoelectronics. Index Terms— Germanium …

… Nanomembranes (NMs) provide an alternative to this approach while offering … the Porous
germanium Efficient Epitaxial LayEr Release (PEELER) process for waferscale growth of …