… etching characteristics of a TiN hard mask in terms of etch rate and faceting when using a
dielectric etch process. … the etching characteristics of a TiN hard mask in terms of etch rate and …

… Therefore, the objective of this work is to scrutinize the Al 2 O 3 hard mask etch mechanism
… possible chemical changes at the mask surface over the course of a DRIE process. To do so, …

… Moreover, ArF photoresist has the inherent demerit of poor etch … process (TLR)1 have
been investigated. This paper will focus on TLR process consisted of multi-function hard mask (…

… Therefore, the objective of this work is to scrutinize the Al2O3 hard mask etch mechanism …
of possible chemical changes at the mask surface over the course of a DRIE process. To do so, …

… As microloading is a constant effect during all the etching process, all depth samples were
normalized with respect to the microloading profile obtained form set 1 data, to eliminate the …

… dry-etching to investigate the effect of the deposition process condition on the surface
characteristics of an ACL film to be used as a dry etch hard mask in an HAR etch process. … process …

… a dry etch hard mask with high etching selectivity, easy removal by photo resist strip process
… , dry etch rate, extinction coefficient, and cleaning removal amount for application as the dry …

… ion etching processes for SiO2 and SiNx hard masks where the fluorine-based etch steps …
For SiO2 etching an etch-step duration of 30 s resulted in a doubled selectivity of almost 4:1 …

… A very high etch selectivity, in excess of 60, for silicon etching process towards the mask
in etching processes with fluorine plasma chemistry were achieved. Future work will focus on …

… selection of hard mask material and thickness and the choice of the right dry etch process for
… the effect of using different hard mask materials and dry etch processes on the integration of …