Etching Characteristics of Defects in the InGaAsP‐InP LPE Layers

T Kotani, S Komiya, S Nakai… - Journal of The …, 1980 - iopscience.iop.org
ABSTRACT Defects in the InGaAsP-InP multiepitaxial layers on the InP (III) P substrate were
investigated using chemical etching techniques. Threading dislocations~ stacking faults …

The consequences of dislocations and thermal degradation on the quality of InGaAsP/InP epitaxial layers

B Sartorius, F Reier, P Wolfram - Materials Science and Engineering: B, 1991 - Elsevier
The consequences of dislocations and thermal degradation on the quality of InGaAsP/InP
epitaxial layers Page 1 Materials Science and Engineering, B9 ( 1991 ) 109-113 109 The …

The Interrelationship Between Structure and Properties in InP and InGaAsP Materials

S Mahajan - MRS Online Proceedings Library, 1980 - Springer
Three examples pertaining to the influence of heavy doping on the microscopic perfection of
as-grown InP crystals, thermal decomposition of InP crystals and epi-layers and optically …

Lattice defects in LPE InP InGaAsP InGaAs structure epitaxial layers on InP substrates

K Ishida, Y Matsumoto, K Taguchi - physica status solidi (a), 1982 - Wiley Online Library
Lattice defects generated during LPE growth of InP InGaAsP InGaAs structure epitaxial
layers on InP substrates are studied. Two different kinds of dislocations are observed at the …

Transmission electron microscopic observation of defects in heavily doped LPE InGaAsP layers with Zn, Cd, Sn and Te

O Ueda, I Umebu, T Kotani - Journal of Crystal Growth, 1983 - Elsevier
Defects induced in heavily doped InGaAsP crystals (λ= 1.3 μm) with Zn, Cd, Sn and Te as
dopants, grown by liquid phase epitaxy, were characterized by transmission electron …

Photoluminescence of undoped In0. 53Ga0. 47As/InP grown by the vapor phase epitaxy technique

E Towe - Journal of Applied Physics, 1982 - pubs.aip.org
Recently, 1110.53 Gao. 47 As has been demonstrated to have a potential for applications in
optical sources and detectors operating near 1.65 11m. Laser diode devices and …

A study of the growth of high-purity InGaAs by conventional LPE

TC Penna, MC Tamargo, WL Swartzwelder - Journal of crystal growth, 1984 - Elsevier
We report the study of several parameters which affect background impurity levels in In 0.53
Ga 0.47 As layers grown by LPE, on (100) oriented InP substrates. Net carrier …

InGaAsP/InGaP superlattices by conventional MBE with molten metal solution phosphorus source

MA Putyato, VV Preobrazhenskii, BR Semyagin… - Journal of crystal …, 2003 - Elsevier
A phosphorus beam source utilizing thermal decomposition of InP is employed in a
molecular beam epitaxy system. Quaternary InGaAsP films with reproducible P and As …

The influence of LPE growth techniques on the alloy composition of InGaAsP

M Feng, LW Cook, MM Tashima, TH Windhorn… - Applied Physics …, 1979 - pubs.aip.org
In experiments on the LPE growth of InGaAsP on (100)‐InP substrates, it has been found
that constant‐composition epitaxial layers can be grown at constant temperature using the …

Growth of GaInAsP using ethyldimethylindium and tertiarybutylphosphine

PR Sharps, ML Timmons, TS Colpitts - Applied physics letters, 1991 - pubs.aip.org
The growth of GaInAsP lattice matched to GaAs by organometallic vapor phase epitaxy
using ethyldimethylindium and tertiarybutylphosphine is reported for the first time. The …